Extremely Low Frequency-Magnetic Field (ELF-MF) Exposure Characteristics among Semiconductor Workers - Choi S; Cha W; Park J; Kim S; Kim W; Yoon C; Park JH; Ha K; Park D (International Journal of Environmental Research and Public Health, 2018)
FEMU ID: 34893; EMF-Portal URL: https://www.emf-portal.org/en/article/34893