Analysis of magnetic field disturbances generated by metallic implants at 0.31T tech./dosim.

By: Guraliuc AR, Scartabelli V, Nepa P, Manara G, Caramella D
Published in: 2011 IEEE International Symposium on Antennas and Propagation (APSURSI), Spokane, WA, USA. IEEE, 2011: 124-126; ISBN 978-1-4244-9562-7
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Exposure