研究のタイプ: 医学/生物学の研究 (experimental study)

[UV誘発DNA損傷の修復合成中の哺乳類細胞の無線周波マイクロ波ばく露] med./bio.

Radiofrequency (microwave) radiation exposure of mammalian cells during UV-induced DNA repair synthesis.

掲載誌: Radiat Res 1987; 110 (2): 255-266

この研究は、MRC-5正常ヒト二倍体線維芽細胞を用いて、紫外線UV)によるDNA損傷の修復過程に対する高周波電磁界(RFR)ばく露の影響を調べた。RFRばく露に用いたのは、周波数350 MHz、850 MHz、1.2 GHzの連続波(CW)およびパルス波(PW)で、電力密度 1(または5)および10 mW / cm2であり、それぞれの周波数での最大SAR値(10mW / cm 2での)は、0.39±0.15 W / kg、3.0 W / kg、2.7±1.6 W / kgである。その結果、ばく露時間が1〜3時間で、温度が37℃に保たれた場合、CWおよびPWのRFRばく露は、予め作成されたUV損傷DNAへの修復複製標識の取り込み速度に影響しなかった;UV損傷後の修復期間中、温度が39℃に保たれた場合、350および850MHzのPWのRFRばく露は影響しなかった;UV照射なしの細胞でのRFRばく露のみによる修復合成の誘導アッセイの結果は、37℃での350、850、1200 MHzのCWおよびPW、および39℃での350、850 MHzのPWのいずれでも陰性であった、と報告している。

The detailed summary of this article is not available in your language or incomplete. Would you like to see a complete translation of the summary? Then please contact us →

研究目的(著者による)

To investigate the effect of continuous wave (CW) and pulsed wave (PW) radiofrequency radiation in the microwave range on UV-induced DNA repair in normal human diploid fibroblasts.
The first question was whether, immediately after UV light irradiation, radiofrequency radiation at low power densities would interfere with at least one of the steps occuring in the DNA repair process. The second question was wether radiofrequency exposure by itself, without any UV preexposure, was capable of inducing DNA repair and the third question was whether pulsed wave radiofrequency radiation (medium temperature at constant 39°C), could affect incorporation of precursor radioactivity into cellular DNA by normal semiconservative synthesis.

影響評価項目

ばく露

ばく露 パラメータ
ばく露1: 350 MHz
Modulation type: pulsed, CW
ばく露時間: 1, 2 or 3 h
  • SAR: 390 µW/g mean (in square dishes; +/- 0.15 W/kg at 10 mW/cm²)
  • 電力密度: 50 W/m² mean (10 mW/cm²; for PW exposure)
  • 電力密度: 18 µW/cm² unspecified (to 0.71 mW/cm²; in the square dishes.)
ばく露2: 850 MHz
Modulation type: pulsed, CW
ばく露時間: 3 h
  • SAR: 600 µW/g unspecified (to 9.9 W/kg; in the square dishes.)
  • 電力密度: 100 W/m² mean
  • SAR: 4.5 mW/g mean (+/- 3.0 W/kg; at 10 mW/cm²; in the square dishes.)
ばく露3: 850 MHz
Modulation type: pulsed, CW
ばく露時間: 3 h
-
ばく露4: 1.2 GHz
Modulation type: pulsed, CW
ばく露時間: 3 h
  • SAR: 2.7 mW/g mean (+/- 1.6 W/kg; in the square dishes; at 10 mW/cm².)
  • 電力密度: 100 W/m² mean
  • SAR: 700 µW/g unspecified (to 7.3 W/kg; in the square dishes.)

ばく露1

主たる特性
周波数 350 MHz
タイプ
  • electromagnetic field
波形
  • sinusoidal
ばく露時間 1, 2 or 3 h
Modulation
Modulation type pulsed, CW
Pulse width 10 µs
Duty cycle 0.05 %
Repetition frequency 5,000 Hz
Additional information

Pulse/packet 1:20

ばく露装置
ばく露の発生源/構造
ばく露装置の詳細 Plexiglas dishes immersed into rectangular water baths.
Additional information TEM-cell for exposure and an identical TEM-cell for control were placed inside anechoic chamber serving as 37°C warm room.
パラメータ
測定量 種別 Method Mass 備考
SAR 390 µW/g mean 測定値 - in square dishes; +/- 0.15 W/kg at 10 mW/cm²
電力密度 50 W/m² mean 測定値 - 10 mW/cm²; for PW exposure
電力密度 18 µW/cm² unspecified 測定値 - to 0.71 mW/cm²; in the square dishes.

ばく露2

主たる特性
周波数 850 MHz
タイプ
  • electromagnetic field
波形
  • sinusoidal
特性
  • far field
ばく露時間 3 h
Modulation
Modulation type pulsed, CW
Pulse width 10 µs
Duty cycle 0.05 %
Repetition frequency 5,000 Hz
Additional information

Pulse/packet 1:20

ばく露装置
ばく露の発生源/構造
ばく露装置の詳細 The incubation dishes were placed in a Plexiglas water bath.
Additional information Exposures preformed in anechoic chamber.
パラメータ
測定量 種別 Method Mass 備考
SAR 600 µW/g unspecified 測定値 - to 9.9 W/kg; in the square dishes.
電力密度 100 W/m² mean 測定値 - -
SAR 4.5 mW/g mean 測定値 - +/- 3.0 W/kg; at 10 mW/cm²; in the square dishes.

ばく露3

主たる特性
周波数 850 MHz
タイプ
  • electromagnetic field
波形
  • sinusoidal
特性
  • far field
ばく露時間 3 h
Modulation
Modulation type pulsed, CW
Pulse width 100 µs
Duty cycle 0.5 %
Packets per second 5,000
Additional information

Pulse/packet 1:20

ばく露装置
ばく露の発生源/構造
ばく露装置の詳細 The incubation dishes were placed in a Plexiglas water bath.
Additional information Exposures preformed in anechoic chamber.
パラメータ

No parameters are specified for this exposure.

ばく露4

主たる特性
周波数 1.2 GHz
タイプ
  • electromagnetic field
ばく露時間 3 h
Additional information Near Field exposure
Modulation
Modulation type pulsed, CW
Pulse width 3 µs
Duty cycle 0.24 %
Repetition frequency 80,000 Hz
Additional information

Pulse/packet 1:4

ばく露装置
ばく露の発生源/構造
ばく露装置の詳細 The incubation dishes were placed in a Plexiglas water bath.
Additional information Exposures preformed in anechoic chamber.
パラメータ
測定量 種別 Method Mass 備考
SAR 2.7 mW/g mean 測定値 - +/- 1.6 W/kg; in the square dishes; at 10 mW/cm².
電力密度 100 W/m² mean 測定値 - -
SAR 700 µW/g unspecified 測定値 - to 7.3 W/kg; in the square dishes.

ばく露を受けた生物:

方法 影響評価項目/測定パラメータ/方法

研究対象とした生物試料:
調査の時期:
  • ばく露後

研究の主なアウトカム(著者による)

Radiofrequency radiation for 1 to 3 h at 37°C (continuous wave or pulsed wave) had no effect on the rate of repair replication label incorporated into preexisting UV-damaged DNA. Pulsed wave radiation, with a constant temperature of 39°C at 350- and 850 MHz during the repair period after UV damage, also had no effect. Assay for induction of repair synthesis by radiofrequency exposure alone in non-UV irradiated cells was negative for the continuous wave (350-, 850-, and 1200-MHz) and pulsed wave radiofrequency radiation at 37°C and the 350- and 850-MHz radiofrequency radiation at 39°C. Radiofrequency exposure does not induce DNA repair under these experimental conditions. No effect on incorporation of [³H]thymidine into DNA undergoing semiconservative synthesis was observed in preliminary experiments (at 39°C and pulsed wave radiofrequency radiation at the frequencies of 350-, 850-, and 1200 MHz).

研究の種別:

研究助成