研究のタイプ: 医学/生物学の研究 (experimental study)

[電磁パルスばく露はラットにベータアミロイドタンパクの発現過剰を誘導する] med./bio.

Electromagnetic pulse exposure induces overexpression of beta amyloid protein in rats.

掲載誌: Arch Med Res 2013; 44 (3): 178-184

この研究は、電磁パルスばく露ラット記憶酸化ストレスに及ぼす影響を調べた。40匹の健康な雄のSprague Dawleyラットを4群に分けた:3つのばく露群(電磁パルス電界強度50 kV/m、繰り返し周波数100 Hz)をそれぞれ100発(ばく露時間1秒)、1000発(同10秒)、10000発(同100秒))与えた)と擬似ばく露群である。影響評価項目は、認知および記憶の能力(モーリス水迷路試験)、酸化ストレス指標(SOD活性、GSH含有量)、アルツハイマー病関連タンパクの発現とした。その結果、擬似ばく露群に比べばく露群では、モーリス水迷路試験で認知および記憶の障害が見られた;SOD活性およびGSH含有量の低下が見られた;免疫組織化学的染色により、ベータアミロイドタンパク(Aβ)の増加が示された;ウェスタンブロット法により、AβオリゴマーやAβ前駆体の発現増加が示された、などを報告している。

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研究目的(著者による)

To study whether a single high electromagnetic pulse exposure could induce cognitive and memory impairment, thus finding a possible relationship between electromagnetic pulse exposure and Alzheimer's disease.

詳細情報

40 healthy male rats were divided into 4 groups: 3 exposure groups (100, 1000, and 10,000 pulse application) and 1 sham exposure group. All rats were sacrificed 18 months after the single exposure. 5 rats per group were used for immunohistochemistry, 5 rats for Western blot analysis.

影響評価項目

ばく露

ばく露 パラメータ
ばく露1:
ばく露時間: 100 pulses (i.e. 1 s)
ばく露2:
ばく露時間: 1000 pulses (i.e. 10 s)
ばく露3:
ばく露時間: 10,000 pulses (i.e. 100 s)

ばく露1

主たる特性
周波数
タイプ
  • electromagnetic field
波形
  • pulsed
ばく露時間 100 pulses (i.e. 1 s)
Additional information pulse application (ultrashort pulse width and a very fast rise time; exact data not given); repetition rate 100 Hz
ばく露装置
ばく露の発生源/構造
  • spark gap pulse generator
チャンバの詳細 animals were placed in a special plastic box (50 cm x 40 cm x 30 cm); no metallic parts were used and animals were able to move freely in the box; box was placed on the animal platform
ばく露装置の詳細 pulse generator and an animal platform of the same height were placed in an electromagnetic shielding chamber
Sham exposure A sham exposure was conducted.
パラメータ
測定量 種別 Method Mass 備考
電界強度 50 kV/m - - - -

ばく露2

主たる特性
周波数
タイプ
  • electromagnetic field
波形
  • pulsed
ばく露時間 1000 pulses (i.e. 10 s)
Additional information pulse application (ultrashort pulse width and a very fast rise time; exact data not given); repetition rate 100 Hz
ばく露装置
ばく露の発生源/構造
  • E1と同じ装置
Sham exposure A sham exposure was conducted.
パラメータ
測定量 種別 Method Mass 備考
電界強度 50 kV/m - - - -

ばく露3

主たる特性
周波数
タイプ
  • electromagnetic field
波形
  • pulsed
ばく露時間 10,000 pulses (i.e. 100 s)
Additional information pulse application (ultrashort pulse width and a very fast rise time; exact data not given); repetition rate 100 Hz
ばく露装置
ばく露の発生源/構造
  • E1と同じ装置
Sham exposure A sham exposure was conducted.
パラメータ
測定量 種別 Method Mass 備考
電界強度 50 kV/m - - - -

ばく露を受けた生物:

方法 影響評価項目/測定パラメータ/方法

研究対象とした生物試料:
研究対象とした臓器系:
調査の時期:
  • ばく露後

研究の主なアウトカム(著者による)

The electromagnetic pulse exposure caused clear cognitive and memory impairment in all exposure groups compared with sham exposure at 18 months after exposure. Determination of oxidative stress indexes showed a decreased superoxide dismutase enzyme activity and glutathione content in exposure groups compared with the sham exposure group (significant only for glutathione). Immunohistochemical staining showed increased beta-amyloid protein in the exposure groups compared with the sham exposure group. Western blot analysis showed increased expressions of the amyloid beta oligomer and beta amyloid protein precursor (APP) in the exposure groups. An increased expression of LC3-II was also found.
The authors conclude that an electromagnetic pulse exposure could cause long-term impairment in cognition and memory of rats, resulting in Alzheimer's disease-like symptoms.

研究の種別:

研究助成

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