研究のタイプ: 医学/生物学の研究 (experimental study)

[異なる強度およびばく露時間の超低周波電界のミスマッチ陰性電位に対する影響] med./bio.

Effects of extremely low-frequency electric fields at different intensities and exposure durations on mismatch negativity.

掲載誌: Neuroscience 2014; 272: 154-166

この研究は、50Hz電界ばく露したラットにおいて、事象関連電位(ERP)の成分であるミスマッチ陰性電位(MMN)反応を測定し、その後、脳組織アポトーシスおよび酸化損傷を測定した。90匹の3月齢ラットを15匹ずつの6群に分けた:2週間の擬似ばく露群(C2)、4週間の擬似ばく露群(C4)、2週間の電界(12 kV/mまたは18kV/m)ばく露群(E12-2、E18-2)、同じく4週間ばく露群(E12-4、E18-4)。ばく露終了後に麻酔下でMMNを測定した後、屠殺して組織検査を実施した。その結果、電界強度およびばく露時間に依存して、ERPパラメータが変化した;E18-4群ではC4群に比べ、MMN振幅が有意に低下した;全てのばく露群で対照群に比べ、4ヒドロキシノネナール量が増加していた、と報告している。

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研究目的(著者による)

To investigate the effect of exposure to a 50 Hz-electric field on mismatch negativity component of event-related potentials as well as on apoptosis and oxidative stress in the rat brain.

詳細情報

6 groups of rats were examined (n= 15 per group): 1.) sham exposure for 2 weeks, 2.) sham exposure for 4 weeks, 3.) exposure to an electric field, 12 kV/m for 2 weeks, 4.) exposure to an electric field, 18 kV/m for 2 weeks, 5.) exposure to an electric field, 12 kV/m for 4 weeks and 6.) exposure to an electric field, 18 kV/m for 4 weeks.
At the end of the exposure/sham exposure period mismatch negativity responses were recorded in anesthetized rats. Afterwards, rats were killed and brain tissues were removed.

影響評価項目

ばく露

ばく露 パラメータ
ばく露1: 50 Hz
ばく露時間: 1 hour/day for 2 or 4 weeks
ばく露2: 50 Hz
ばく露時間: 1 hour/day for 2 or 4 weeks

ばく露1

主たる特性
周波数 50 Hz
タイプ
  • electric field
ばく露時間 1 hour/day for 2 or 4 weeks
ばく露装置
ばく露の発生源/構造
  • モノポール
  • parallel plate capacitor
チャンバの詳細 rats were exposed in plastic cages
ばく露装置の詳細 parallel copper plates (50 x 80 cm) were plated with zinc (2-mm thickness); corners of parallel plates were rounded to produce an uniform electric field; plates were placed upright on wooden stands and positioned parallel to each other; plastic cage was placed between plates; plates were spaced at 50 cm distance
Sham exposure A sham exposure was conducted.
Additional information maximum background magnetic field was 0.1 µT (measured), homogeneity and uniformity of electric field was measured (maximum variation less than 1 %)
パラメータ
測定量 種別 Method Mass 備考
電界強度 12 kV/m - 測定値および計算値 - -
磁束密度 1 µT maximum - - -

ばく露2

主たる特性
周波数 50 Hz
タイプ
  • electric field
ばく露時間 1 hour/day for 2 or 4 weeks
ばく露装置
ばく露の発生源/構造
  • E1と同じ装置
パラメータ
測定量 種別 Method Mass 備考
電界強度 18 kV/m - 測定値および計算値 - -
磁束密度 1 µT maximum - - -

ばく露を受けた生物:

方法 影響評価項目/測定パラメータ/方法

研究対象とした生物試料:
研究対象とした臓器系:
調査の時期:
  • ばく露後

研究の主なアウトカム(著者による)

In all exposure groups, the lipid peroxidation was significantly increased compared to the corresponding sham exposure groups. In comparison to the control group, the content of carbonyl groups was significantly increased in group 4 (18 kV/m for 2 weeks), group 5 (12 kV/m for 4 weeks) and group 6 (18 kV/m for 4 weeks). However, no apoptotic cells were found in any of the groups.
In group 6 (18 kV/m for 4 weeks), the mismatch negativity amplitude was significantly decreased in comparison to the 4 weeks sham exposure group. In group 3 (12 kV/m for 2 weeks) and group 4 (18 kV/m for 2 weeks), the mismatch negativity latency was significantly increased compared to the 2 weeks sham exposure group.
The authors conclude that exposure to a 50 Hz-electric field could have an influence on mismatch negativity component of event-related potentials in rats and that these effects could be due to oxidative stress in the rat's brain.

研究の種別:

研究助成

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