研究のタイプ: 医学/生物学の研究 (experimental study)

[2100 MHz電磁界はばく露時間に依存して視覚誘発電位および酸化/抗酸化状態に異なる影響を与える] med./bio.

2100-MHz electromagnetic fields have different effects on visual evoked potentials and oxidant/antioxidant status depending on exposure duration.

掲載誌: Brain Res 2016; 1635: 1-11

この研究は、ラットを用いて、視覚誘発電位(VEPs)および酸化/抗酸化状態に対する2100 MHz電磁界EMF)の影響のばく露時間依存性を調べた。ラットは、2つのばく露群(E1群およびE10群)およびそれぞれの擬似ばく露対照群(S1群およびS10群)に分け、1日2時間のEMFばく露をE1群は1週間、E10群は10週間与えた。ばく露終了後に、麻酔下でVEPsを記録し、脳の組織検査を行った。その結果、脳組織チオバルビツール酸反応物質(TBARS)および4-ヒドロキシ-2-ノネナール(4-HNE)のレベルが、それぞれの対照群に比べ、E1群では有意に低下、E10群では上昇した;E1群ではS1群に比べ、カタラーゼ(CAT)、グルタチオンペロキシダーゼ(GSH-Px)の活性および一酸化窒素NO)およびグルタチオンGSH)のレベルが有意に上昇し、スーパーオキシドジスムターゼ(SOD)活性の低下が観察された;E10群ではS10群に比べ、CAT、GSH-Pxの活性およびNOレベルの低下が見られた;VEPの全ての成分の潜時がE1群ではS1群に比べ短縮されたが、E10群ではS10群に比べ、P1成分以外の全ての成分の潜時が延長された、などばく露期間により異なる影響が観察されたと報告している。

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研究目的(著者による)

The effects of exposure of rats to a 2100 MHz electromagnetic field on visual evoked potentials and oxidative stress in the brain should be investigated.

詳細情報

Male rats were divided into 4 groups (n=14 each): 1) exposure to the electromagnetic field for 1 week, 2) sham exposure for 1 week, 3) exposure to the electromagnetic field for 10 weeks, 4) sham exposure for 10 weeks. 24 hours after the end of exposure, visual evoked potentials were recorded and subsequently, rats were killed and the brain was investigated.

影響評価項目

ばく露

ばく露 パラメータ
ばく露1: 2,100 MHz
Modulation type: pulsed
ばく露2: 2,100 MHz
Modulation type: pulsed

ばく露1

主たる特性
周波数 2,100 MHz
タイプ
  • electromagnetic field
Modulation
Modulation type pulsed
Repetition frequency 217 Hz
ばく露装置
ばく露の発生源/構造
  • モノポール
Distance between exposed object and exposure source 10 cm
Sham exposure A sham exposure was conducted.
パラメータ
測定量 種別 Method Mass 備考
電力 2 W peak - - -
電界強度 27.15 V/m minimum 測定値 - -
電界強度 35.2 V/m maximum 測定値 - -
SAR 0.57 W/kg minimum 測定値および計算値 partial body -
SAR 0.95 W/kg maximum 測定値および計算値 partial body -

ばく露2

主たる特性
周波数 2,100 MHz
タイプ
  • electromagnetic field
Modulation
Modulation type pulsed
Repetition frequency 217 Hz
ばく露装置
ばく露の発生源/構造
  • E1と同じ装置
Sham exposure A sham exposure was conducted.
パラメータ
測定量 種別 Method Mass 備考
電力 2 W peak - - -
電界強度 27.15 V/m minimum 測定値 - -
電界強度 35.2 V/m maximum 測定値 - -
SAR 0.57 W/kg minimum 測定値および計算値 partial body -
SAR 0.95 W/kg maximum 測定値および計算値 partial body -

ばく露を受けた生物:

方法 影響評価項目/測定パラメータ/方法

研究対象とした生物試料:
研究対象とした臓器系:
調査の時期:
  • ばく露後

研究の主なアウトカム(著者による)

The latencies of all visual evoked potentials were significantly shortened in group 1 compared to the sham exposure group, while they were significantly increased (except P1) in group 3 compared to the sham exposure group.
Lipid peroxidation was significantly decreased after one week of exposure to the electromagnetic field (group 1) compared to the respective sham exposure group (group 2), while it was significantly increased after 10 weeks of exposure (group 3) compared to the sham exposure group (group 4). The enzyme activities of catalase and glutathione peroxidase as well as the levels of nitric oxide and glutathione were significantly increased in group 1, while the superoxide dismutase enzyme activity was significantly decreased compared to the sham exposure group. In group 3, catalase and glutathione peroxidase enzyme activities and the level of nitric oxide were significantly decreased compared to the sham exposure group.
There was a significant positive correlation between all visual evoked potentials latencies and lipid peroxidation in the brain.
The authors conclude that exposure of rats to 2100 MHz electromagnetic field might alternate visual evoked potentials and induce oxidative stress in the brain depending on the exposure duration. Thus, short term exposure (1 week) might have a protective effect, while long term exposure (10 weeks) might have an adverse effect on the oxidative status in the brain.

研究の種別:

研究助成

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